Ultra-high Resolution Electron-beam Lithography System
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Key information
Overview
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.
8803 Rüschlikon ZH
Ja According to the tender documents.
Nein
Nein
Nein
gemäss Unterlagen
simap.ch (für registrierte Anbietende)
en
30 days net from invoice date.
The General Terms and Conditions (GTC) of the ETH Domain for goods in force at the time of publication of this tender apply. The applicable version forms part of the tender documents.
The award is subject to the required internal approvals and to the availability of the corresponding funds.
https://ted.europa.eu/udl?uri=TED:NOTICE:679334-2026:HTML:EN:HTML
In accordance with Article 56 paragraph 1 of the Public Procurement Act (PPA), a written appeal against this decision can be lodged with the Federal Administrative Court, P.O. Box, 9023 St. Gallen, Switzerland, within 20 days of notification. Any appeal is to be submitted in duplicate and must include what is being sought, the grounds for appeal, evidence and the signature of the person lodging the appeal or his or her representative. A copy of this decision and available evidence must be included. The provisions of the Administrative Procedure Act (APA) on legal holidays do not apply in accordance with Article 56 paragraph 2 of the PPA.