Tender for Plasma 2 setup: InP ICP Etch
EF29Contract award notice – general directive, standard regime0c9ed4f5-a390-406b-8b49-ca70f1a22665NTNederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
Estimated value—
Deadline—
Competition00 participants
Lots11 lot
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Key information
Identifier
Contract type
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Deadline
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CPV codes
42000000 - Industrial machinery
Status
Awarded
Notice type
EF29Contract award notice – general directive, standard regime
Source
Estimated value
—
Publication date
17 Jul 2026, 13:59
Overview
Levering van een InP ICP Etch zie leidraad, levering van een plasma 2 setup InP ICP Etch
Lots1
Documentation1
1 document
- 209.3 KB
TN602623 - EF29 Aankondiging gegunde opdracht - algemene richtlijn, standaardregeling 20260717155922.pdf
PDF document
Award criteria0
No procedure-level award criteria recorded.