Metal Organic Chemical Vapor Deposition (MOCVD)
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Key information
Overview
The contract concerns the supply, installation, testing (FAT/SAT), and commissioning of a Metal Organic Chemical Vapor Deposition (MOCVD) system for research purposes within the SAP-NL (National Scalable Atomic Processing Line) infrastructure. The system will be used for the controlled deposition of (Al)GaN and multiple 2D materials at atomic scale, supporting research into energy-efficient semiconductors, quantum technologies, and advanced communication systems. The system must be integrated into a contamination-controlled cleanroom environment and meet a comprehensive set of technical and functional requirements which can be found in uploaded document.