Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System
pin-cfc-socialPrior information notice or a periodic indicative notice used as a call for competition – light regime00441853-2026OYOulun yliopisto
30 days left
Estimated value—
Deadline30 days left10 Aug 2026, 20:59
Competition00 participants
Lots11 lot
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Key information
Identifier
00441853-2026
Contract type
—
Deadline
10 Aug 2026, 20:59
CPV codes
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Status
Planned
Notice type
pin-cfc-socialPrior information notice or a periodic indicative notice used as a call for competition – light regime
Source
Estimated value
—
Publication date
25 Jun 2026, 22:00
Overview
University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, such as biomedicine, sensor technology, and optics. For more information, please contact the contracting unit to organize a dialogue by 10.8.2026 at the address: [email protected]. Please note that contracting authority is on summer holiday during 11.7.-2.8.2026.
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Timeline
25 Jun 2026, 09:54
Dispatch date
Milestone
25 Jun 2026, 22:00
Publication date
Publication
10 Aug 2026, 20:59
Participation request deadline
Deadline
Version history
None recorded.
Lots1
Documentation0
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Award criteria0
No procedure-level award criteria recorded.