Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool - PR1184925-3460-W
CN-GEN-STDContract notice – general directive, standard regimepr1184925-3460-wFBFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. - Einkauf B12 - Vergabestelle Bau
Estimated value—
DeadlineExpired18 Jun 2026, 09:00
Competition00 participants
Lots11 lot
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Key information
Identifier
Contract type
—
Deadline
18 Jun 2026, 09:00
CPV codes
31712100 - Microelectronic machinery and apparatus
Status
UNKN
Notice type
CN-GEN-STDContract notice – general directive, standard regime
Source
Estimated value
—
Publication date
13 May 2026, 10:02
Overview
PR1184925-3460-W Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool
Dresden, 01109, Dresden, Germany
Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool
Dresden, 01109, Dresden, Germany
Lots1
Documentation0
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Award criteria0
No procedure-level award criteria recorded.